Закономерности накопления ионно-имплантированного гелия в поверхностных слоях никеля
Диссертация
Целью настоящей работы являлось изучение пространственного распределения, кинетики накопления и реэмиссии гелия в условиях облучения низкоэнергетическими ионами Не*, последовательной и одновременной бомбардировки ионами гелия и водорода, а также при структурно-фазовых превращениях. В качестве основного исследуемого металла был выбран никель, являющийся модельным материалом для изучения процессов… Читать ещё >
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